| 摘要 |
PURPOSE: A method for correcting a line-width variation by stage tilt is provided to easily minimize the line-width variation occurring in the production of photomask, to ensure the uniformity of line-width, and thus to improve the performance of photomask. CONSTITUTION: The method for correcting a line-width variation by stage tilt comprises the first step of exposing a resist with an electron beam along a predetermined pattern; the second step of moving a focus point depending on the position of stage; and the third of corrective exposing a tetragonal design arrangement appropriate to a predetermined defocus dose or a dose appropriate to a predetermined defocus tetragonal design arrangement. In the second step, if the focus point at a normal state is positioned over the stage, it is moved upward of the stage for second exposing of defocus and if the focus point is positioned under the stage, it is moved downward of the stage.
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