| 摘要 |
PURPOSE: An apparatus for fabricating a semiconductor device is provided to prevent condensation of raw materials within a bellows by using an upper heater block and a lower heater block to heat the bellows. CONSTITUTION: A gas injection hole and a gas exhaust hole are formed at a reaction chamber(200). A flow path(230) for transferring a heat exchanger is formed in a shape of a ring along a sidewall of the reaction chamber. A substrate support plate(210) is installed within the reaction chamber in order to load a substrate(220). A support shaft(215) is used for supporting the substrate support plate. The support shaft penetrates a bottom face of the reaction chamber. A couple of flanges(244,242) are installed at an upper end and a lower end of a bellows(240), respectively. An upper heater block is formed with an upper metal cylinder(250), a heat wire(254), and a ceramic insulation board(255). A thermocouple insertion hole(256) is formed at the upper heater block. A lower heater block is formed with a lower metal cylinder(260), a heat wire, and a ceramic insulation board.
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