UPPER PNEUMATICS ASSEMBLY OF WAFER CMP EQUIPMENT

摘要

PURPOSE: An upper pneumatics assembly of wafer CMP equipment is provided to prevent malfunction by minimizing the amount of heat generated from a motor. CONSTITUTION: A regulator(110) is used for regulating the pneumatic supplied to a polishing head. A manifold(120) is used for transmitting the pneumatic to various paths of the polishing head through the regulator. A measuring converter is used for measuring the pneumatic. A fixing plate(140) is installed at a top part of a motor for rotating the polishing head. The manifold is installed at the fixing plate. A bridge(150) is used for separating the manifold from the fixing plate in order to prevent the transmission of the heat from the motor to the manifold.