发明名称 PATTERN FORMING METHOD, METHOD OF MAKING MICRODEVICE, METHOD OF MAKING THIN-FILM MAGNETIC HEAD, METHOD OF MAKING MAGNETIC HEAD SLIDER, METHOD OF MAKING MAGNETIC HEAD APPARATUS, AND METHOD OF MAKING MAGNETIC RECORDING AND REPRODUCING APPARATUS
摘要 All the electrode films corresponding to respective metal materials are laminated on a substrate beforehand, a first electrode film located farthest from the substrate is formed with a first metal pattern suitable for the first electrode film, and then the first electrode film is etched away so as to expose a second electrode film located lower than the first electrode film. Therefore, the second electrode film suitable for a metal material of a second metal pattern can selectively be plated, whereby the second metal pattern can be formed while optimizing the combination of its metal material and electrode film. Also, the second electrode film for the later step does not attach to the previously formed first metal pattern.
申请公布号 US6780738(B2) 申请公布日期 2004.08.24
申请号 US20030409046 申请日期 2003.04.09
申请人 TDK CORPORATION 发明人 KAMIJIMA AKIFUMI
分类号 H01L21/288;G11B5/187;G11B5/31;G11B5/39;H01F41/34;H01L43/08;H01L43/12;H05K1/09;H05K3/10;H05K3/38;(IPC1-7):H01L21/44 主分类号 H01L21/288
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