发明名称 Method of fabricating probe for scanning probe microscope
摘要 A probe is provided for an SPM (Scanning Probe Microscope), and a method is provided for fabricating the probe in which a double side alignment process is not required to simplify the fabricating. The probe includes a cantilever; a body supporting the cantilever; and a tip formed at an end of the cantilever, wherein the cantilever, the body and the tip are made of silicon, and boron is diffused into the cantilever and a predetermined area of the body. The method includes steps of: forming a first mask layer on an area of a silicon substrate to be formed with the body and the tip; etching the silicon substrate in a predetermined depth using the first mask layer to form the tip; removing the first mask and forming a second mask layer on an area of the silicon substrate except for an area to be formed with the body and the cantilever; forming a boron-diffused layer by diffusing boron into an area to be formed with the cantilever and a predetermined area of the body using the second mask; removing the second mask layer and forming a third mask layer on the boron-diffused layer; and etching the silicon substrate using the third mask layer to form the body and the cantilever.
申请公布号 US2004159786(A1) 申请公布日期 2004.08.19
申请号 US20040777941 申请日期 2004.02.12
申请人 KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY 发明人 CHO IL-JOO;PARK EUN-CHUL;HONG SONGCHEOL;YOON EUISIK
分类号 G02B21/00;G01N23/225;G01Q10/00;G01Q60/38;G01Q70/16;G21K7/00;(IPC1-7):G21K7/00;G01N23/00 主分类号 G02B21/00
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