发明名称 |
Method of fabricating probe for scanning probe microscope |
摘要 |
A probe is provided for an SPM (Scanning Probe Microscope), and a method is provided for fabricating the probe in which a double side alignment process is not required to simplify the fabricating. The probe includes a cantilever; a body supporting the cantilever; and a tip formed at an end of the cantilever, wherein the cantilever, the body and the tip are made of silicon, and boron is diffused into the cantilever and a predetermined area of the body. The method includes steps of: forming a first mask layer on an area of a silicon substrate to be formed with the body and the tip; etching the silicon substrate in a predetermined depth using the first mask layer to form the tip; removing the first mask and forming a second mask layer on an area of the silicon substrate except for an area to be formed with the body and the cantilever; forming a boron-diffused layer by diffusing boron into an area to be formed with the cantilever and a predetermined area of the body using the second mask; removing the second mask layer and forming a third mask layer on the boron-diffused layer; and etching the silicon substrate using the third mask layer to form the body and the cantilever.
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申请公布号 |
US2004159786(A1) |
申请公布日期 |
2004.08.19 |
申请号 |
US20040777941 |
申请日期 |
2004.02.12 |
申请人 |
KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
CHO IL-JOO;PARK EUN-CHUL;HONG SONGCHEOL;YOON EUISIK |
分类号 |
G02B21/00;G01N23/225;G01Q10/00;G01Q60/38;G01Q70/16;G21K7/00;(IPC1-7):G21K7/00;G01N23/00 |
主分类号 |
G02B21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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