| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a stimulus sensitive composition having high sensitivity and high resolving power and exhibiting good profile, to provide a photosensitive composition having high sensitivity at ≤200 nm, particularly at exposure wavelength of F<SB>2</SB>laser light (157 nm), and also to provide a new compound which generates an acid or a radical under an external stimulus so as to provide these compositions. <P>SOLUTION: The stimulus sensitive composition contains a compound (A) which generates an acid or a radical under an external stimulus and has a carbonyl group and a fluorine atom, wherein the compound (A) is particularly a compound having a cationic moiety and an anionic moiety and having a carbonyl group and a fluorine atom in the cationic moiety. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
