| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device which properly carries out exposure by vacuum ultraviolet radiation, by preventing out gas generated from a resist from sticking to a projection lens. SOLUTION: In a local gas supply/exhaust opening 180, an inert gas supplied through an inert gas supply tube 196 blows out from an inert gas supply opening 183 and is supplied to a specific space 181, between a projection lens 151 and a wafer 230. The inert gas blown is sucked by vacuum suction force which functions in three exhaust parts 185<SB>-1</SB>to 185<SB>-3</SB>, arranged shifted in the optical axial direction of an exposure light IL one by one and is exhausted to the outside of the exposure device 100 from the exhaust openings 185<SB>-1</SB>to 185<SB>-3</SB>. Thereby, an inert gas flow, which is parallel to the surface of the wafer 230, is formed in the direction starting from the inert gas supply opening 183 toward the exhaust opening part 184. Outgas, generated from the surface of the wafer 230, is made to flow by the inert gas, before it reaches the projection lens 151 and is exhausted from the exhaust openings 185<SB>-1</SB>to 185<SB>-3</SB>. COPYRIGHT: (C)2004,JPO&NCIPI
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