发明名称 MANUFACTURING METHOD FOR TRANSPARENT SILICA GLASS
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for transparent silica glass, by which high purity transparent silica glass with a small water-content is manufactured at a low temperature. SOLUTION: Ultrafine particles of fumed silica, the mean particle diameter of whose primary particles is about 10 nm, are oil-hydraulically pressed into a pressure-formed body. The pressure-formed body is heated and burned in an electric furnace under the condition of an atmospheric pressure. The heating temperature is 1,000-1,400°C; the heating time is 20-24 h at 1,000°C, 10-15 min at 1,200°C, and 5-10 min at 1,400°C. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004224629(A) 申请公布日期 2004.08.12
申请号 JP20030013926 申请日期 2003.01.22
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY 发明人 UCHINO TAKASHI;YAMADA TOMOKO
分类号 C03B20/00;(IPC1-7):C03B20/00 主分类号 C03B20/00
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