发明名称 Fabrication of advanced silicon-based MEMS devices
摘要 A micro-electro-mechanical (MEM) device and an electronic device are fabricated on a common substrate by fabricating the electronic device comprising a plurality of electronic components on the common substrate, depositing a thermally stable interconnect layer on the electronic device, encapsulating the interconnected electronic device with a protective layer, forming a sacrificial layer over the protective layer, opening holes in the sacrificial layer and the protective layer to allow the connection of the MEM device to the electronic device, fabricating the MEM device by depositing and patterning at least one layer of amorphous silicon, and removing at least a portion of the sacrificial layer. In this way, the MEM device can be fabricated after the electronic device on the same substrate.
申请公布号 US2004157426(A1) 申请公布日期 2004.08.12
申请号 US20030410158 申请日期 2003.04.10
申请人 OUELLET LUC;ANTAKI ROBERT 发明人 OUELLET LUC;ANTAKI ROBERT
分类号 B81B3/00;B81B7/00;B81B7/02;B81C99/00;H01L21/8242;(IPC1-7):H01L21/824 主分类号 B81B3/00
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