ANALYZER OF ION IMPLANTATION SYSTEM

摘要

PURPOSE: An analyzer of an ion implantation system is provided to reduce generation of silica and remove oxygen from a sensor by blocking the air in a leakage state of a process chamber. CONSTITUTION: A plurality of opening parts(23) are formed at both sides of a chamber(21). The chamber is surrounded by an insulating material. A thermometer(25) is installed into one side of the chamber. A sensor(26) is installed into the other side of the chamber in order to measure the amount of residual oxygen. A current detector(27) is installed at the sensor. A gas tube(28) is installed at a rear end of the sensor in order to receive a process gas. An exhaust tube(29) is used for exhausting the gas of the gas tube. A heater(30) is installed within the insulation of the chamber. A cooling line(40) is installed along the inside of the chamber. A first supply line(50) is installed at one side of the gas tube. A second supply line(60) is branched from the first supply line in order to receive the cooling gas.