发明名称 SPIN RINSE DRY APPARATUS
摘要 PURPOSE: A spin rinse dry apparatus is provided to prevent contamination due to dispersed chemicals by shielding the dispersed chemicals from a wafer. CONSTITUTION: A plurality of safety covers(150) are installed at an upper side of a main body(110) in order to shield or open the upper side of the main body. A plurality of elastic members(160) are installed at the safety covers in order to maintain a shielding state of the safety covers and shield chemicals from a wafer by providing the elastic force to the safety covers. A cover driving motor(180) is installed at one side of the main body and is connected to upper sides of the safety covers in order to open the covers by using a pulling wire(170) and a rotary shaft(181).
申请公布号 KR20040070600(A) 申请公布日期 2004.08.11
申请号 KR20030006773 申请日期 2003.02.04
申请人 ANAM SEMICONDUCTOR., LTD. 发明人 HAN, GYEONG SU
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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