发明名称 |
SPIN RINSE DRY APPARATUS |
摘要 |
PURPOSE: A spin rinse dry apparatus is provided to prevent contamination due to dispersed chemicals by shielding the dispersed chemicals from a wafer. CONSTITUTION: A plurality of safety covers(150) are installed at an upper side of a main body(110) in order to shield or open the upper side of the main body. A plurality of elastic members(160) are installed at the safety covers in order to maintain a shielding state of the safety covers and shield chemicals from a wafer by providing the elastic force to the safety covers. A cover driving motor(180) is installed at one side of the main body and is connected to upper sides of the safety covers in order to open the covers by using a pulling wire(170) and a rotary shaft(181).
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申请公布号 |
KR20040070600(A) |
申请公布日期 |
2004.08.11 |
申请号 |
KR20030006773 |
申请日期 |
2003.02.04 |
申请人 |
ANAM SEMICONDUCTOR., LTD. |
发明人 |
HAN, GYEONG SU |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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