发明名称 SEMICONDUCTOR DEVICE FABRICATION SYSTEM
摘要 PURPOSE: A semiconductor device fabrication system is provided to prevent the generation of particles in a setting process of a wafer guide by forming the wafer guide and a plate with one body. CONSTITUTION: A wafer is loaded on an upper surface of a plate(100). A cover(140) is used for covering the upper surface of the plate. A wafer guide(200) is used for preventing the movement of the wafer loaded on the upper surface of the plate. The wafer guide is installed at an edge of the plate. The wafer guide and the plate are formed with one body in order to fix the wafer plate to the plate. The wafer guide is formed with ceramics.
申请公布号 KR20040069446(A) 申请公布日期 2004.08.06
申请号 KR20030005840 申请日期 2003.01.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KOO, JA JUN
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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