发明名称 METHOD AND APPARATUS FOR INSPECTING FOREIGN OBJECT
摘要 PROBLEM TO BE SOLVED: To provide a foreign object inspecting apparatus capable of increasing S/N ratio when the quantity of detection light from a foreign object and that from a pattern are set to be S and N, respectively, when inspecting the foreign object on a substrate having a pattern. SOLUTION: An S-polarization beam is emitted to the surface of the substrate 1 to be inspected by a lighting section 3 with an axis nearly in parallel with the surface of the substrate 1 to be inspected as an optical axis. A line sensor 6 detects the component of a P-polarization beam to the surface of the substrate 1 to be inspected in reflection light, scattered light, and diffraction light in the optical axis, where a light reception angleβ1 is an acute angle and a difference angle from the beam is less than 30°. A line sensor 8 detects all components of the reflection light, the scattered light, and the diffraction light in the optical axis, where a light reception angleβ2 is an elevation angle and a difference angle from the beam becomes nearly 0°. Then, detection results obtained by the line sensors 6, 8 are computed and the influence of the diffraction light from the pattern is eliminated for judging the presence of the foreign object. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004219280(A) 申请公布日期 2004.08.05
申请号 JP20030007706 申请日期 2003.01.16
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 NAGASAKI TATSUO;TAKADA KAZUMASA;MASE KENICHIRO;NOMURA TAKESHI
分类号 G01N21/956;H01L21/66;(IPC1-7):G01N21/956 主分类号 G01N21/956
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