| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflection-type electricmagnetic radiation diffuser which is effective in extremely short wavelengths, such as the wavelengths of EUVL(extreme-ultraviolet photolithography) system. SOLUTION: The electricmagnetic radiation diffuser comprises, a substrate having a first and second surfaces, in which the first surface includes a structure having a three-dimensional profile of individual grating unit; a reflecting coating formed on the first surface, which is adapted to the structure; and an absorption grating formed on the reflecting coating, which contains space. Where the absorption grating absorbs the first part of the electromagnetic radiation, while the reflecting coating diffusingly reflects the second part of the electromagnetic radiation which passes through the space. COPYRIGHT: (C)2004,JPO&NCIPI
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