| 摘要 |
PROBLEM TO BE SOLVED: To provide a device and a method for forming thin film by which an excellent thin film can be formed on a substrate. SOLUTION: A film thickness detector 80 acquires film thickness information indirectly showing the state of a thin film formed on a sheet film (substrate) 8 and gives the information to a control unit 3. Upon receiving the information, the control unit 3 finds the rate of change of the film thickness of the thin film based on the film thickness information. When the control unit 3 confirms that the rate of change of the film thickness reaches an optimum value, namely, when the thin film formed on the sheet film 8 becomes a state suitable for transfer, the unit 3 immediately starts the transfer. Since the pressing timing of the thin film against a substrate W is decided based on the film thickness information in this way, the transfer can be executed at optimum timing and an excellent thin film can be formed on the substrate W irrespective of the peripheral environment of the sheet film 8 and the type of the thin film. COPYRIGHT: (C)2004,JPO&NCIPI
|
