| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a proton neutralizer having the following proper reactivity: it efficiently reacts with protons generated by dark reaction, under relatively mild conditions such that at storing a resist material, without inhibiting the reaction of the protons with a base polymer at exposure; and to provide a resist composition comprising the neutralizer. <P>SOLUTION: The proton neutralizer is composed of a compound having at least one group expressed by the formula: -(CH<SB>2</SB>)m-NH-(<SP>t</SP>BOC) bonding to an adamantyl skeleton, as a first proton neutralizer (in the formula m is an integer of 0-5; and<SP>t</SP>BOC is a tert-butoxycarbonyl group), or a compound represented by the formula: (<SP>t</SP>BOC)-NHOH, as a second proton neutralizer. The resist composition comprises the proton neutralizer. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
