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发明名称
Beschleunigte Plasmareinigung
摘要
申请公布号
DE60005579(T2)
申请公布日期
2004.08.05
申请号
DE2000605579T
申请日期
2000.02.04
申请人
APPLIED MATERIALS, INC.
发明人
CHANDRAN, SHANKAR N.;JONES, GWENDOLYN D.;YIEH, ELLIE;HENDRICKSON, SCOTT;VENKATARAMAN, SHANKAR
分类号
B08B9/08;C23C16/44;H01L21/304;(IPC1-7):C23C16/44;H01J37/32
主分类号
B08B9/08
代理机构
代理人
主权项
地址
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