发明名称 |
Sprayed coating and production method for the same |
摘要 |
A sprayed coating is proposed in which a problem of a condition of oxygen defect which cannot be solved by conventional densification of the sprayed coating is solved, whereby excellent electrical insulation and corrosion resistance can be simultaneously obtained. A sprayed coating formed by plasma spraying inside a semiconductor processing device comprises a metal oxide or a semiconductor oxide, and composition ratio of oxygen with respect to a metal or a semiconductor which composes oxides, that is (oxygen/(metal or semiconductor)) is not less than 80% of a composition ratio in the case of stoichiometric composition.
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申请公布号 |
US2004151839(A1) |
申请公布日期 |
2004.08.05 |
申请号 |
US20040751109 |
申请日期 |
2004.01.05 |
申请人 |
MIYAJI SHINYA;SAITO SHINJI |
发明人 |
MIYAJI SHINYA;SAITO SHINJI |
分类号 |
C23C4/10;(IPC1-7):B05D1/08;B32B9/00 |
主分类号 |
C23C4/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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