INDUCTIVELY COUPLED PLASMA TREATING DEVICE, ESPECIALLY CONCERNED WITH OBTAINING PLASMA UNIFORMITY WITHOUT DETERIORATING PLASMA DENSITY

摘要

PURPOSE: An inductively coupled plasma treating device is provided to obtain plasma uniformity without deteriorating plasma density while partially comprising a conductive member between an RF antenna and plasma formed within a treating chamber, and to execute a uniform plasma treatment. CONSTITUTION: An RF antenna(13) for forming an inductive electric field within a treating chamber is installed in a part corresponding to a dielectric wall(2) configuring an upper wall of the treating chamber. A conductive member(11) is installed between the RF antenna(13) and plasma formed within the treating chamber. The RF antenna(13) is installed so as to cross the conductive member(11) in plural crossing portions(13b). A position of the RF antenna(13) in more than one crossing portion(13b) is higher than other position except the plural crossing portions(13b).