发明名称 |
POWDER METALLURGY SPUTTERING TARGETS AND METHODS OF PRODUCING SAME |
摘要 |
<p>A method of forming a sputtering target and other metal articles having controlled oxygen and nitrogen content levels and the articles so formed are described. The method includes surface-nitriding a deoxidized metal powder and further includes consolidating the powder by a powder metallurgy technique. Preferred metal powders include, but are not limited to, valve metals, including tantalum, niobium, and alloys thereof.</p> |
申请公布号 |
WO2004064114(A2) |
申请公布日期 |
2004.07.29 |
申请号 |
WO2004US00270 |
申请日期 |
2004.01.07 |
申请人 |
CABOT CORPORATION;MICHALUK, CHRISTOPHER, A.;YUAN, SHI;MAGUIRE, JAMES, D. |
发明人 |
MICHALUK, CHRISTOPHER, A.;YUAN, SHI;MAGUIRE, JAMES, D. |
分类号 |
B22F1/00;C23C8/02;C23C8/80;C23C14/34;H01G9/052;(IPC1-7):H01L/ |
主分类号 |
B22F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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