| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive type photosensitive composition which has sensitivity to the wavelength of IR laser, which needs no burning, which yields necessary and sufficient adhesiveness in a coating condition of 25 to 60% humidity in an operation chamber, which can be developed with high sensitivity without generating residues, the pattern of which can be cut with sharp contours and which gives a very hard resist film having scuffing resistance in handling of the resist film before development. <P>SOLUTION: The positive type photosensitive composition contains: an alkali soluble organic polymer substance having a phenolic hydroxyl group; a photothermal conversion substance absorbing the IR component of an image exposure light source to convert it into heat; and polyvinyl acetate. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
