| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polysiloxane having high transparency at ≤193 nm wave length, and excellent resistance to dry-etching, especially excellent resistance to the environment; to provide a method for producing the polysiloxane; and to provide a radiation-sensitive resin composition containing the polysiloxane. <P>SOLUTION: The polysiloxane has a structural unit represented by formula (I), and a structural unit represented by formulas (II) and/or (III). (In the formulas, Y is a divalent hydrocarbon group having a cyclic skeleton, or a substituted derivative thereof; R<SP>1</SP>is a monovalent organic group having an acid dissociable group; R<SP>2</SP>is -H, -OH, a halogen atom or an alkoxy group). The polysiloxane is obtained by co-polycondensing silane compounds corresponding to each structural unit. The radiation-sensitive resin composition contains the polysiloxane and a radiation sensitive acid generator. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
