发明名称 |
PLASMA GENERATOR, OZONE GENERATOR, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
To provide a generator capable of generating plasma and ozone with high efficiency and easy to handle, with a simple structure. An electrode part 10 is formed of electrodes 11 and 12 without dielectric material interposed therebetween. An arc-extinguishing capacitor 13 as a charge storage part for storing charge is connected in series to the electrode part 10. An AC power source 15 generating plasma by causing self-arc-extinguishing discharge between the electrodes 11 and 12 by applying AC voltage to charge and discharge the arc-extinguishing capacitor 13, is connected to both ends of a circuit in which the electrode part 10 and the arc-extinguishing capacitor 13 are connected in series. The arc-extinguishing capacitor 13 and one electrode 12 of the electrode part 10 connected thereto are unitized, for making the electrode part multi-polarized. A unit is constituted of a floating electrode serving as both of the one electrode 12 of the electrode part 10 and one electrode of the arc-extinguishing capacitor 13, an insulating material provided around the floating electrode and a grounding electrode provided around the insulating material. |
申请公布号 |
AU2003292678(A1) |
申请公布日期 |
2004.07.29 |
申请号 |
AU20030292678 |
申请日期 |
2003.12.26 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC.;SATO, NORIYOSHI;MASE, HIROSHI;FUJIWARA, TAMIYA |
发明人 |
NORIYOSHI SATO;HIROSHI MASE;TAMIYA FUJIWARA;TAKESHI TANIGUCHI;SHUITSU FUJII |
分类号 |
C01B13/11;H05H1/24 |
主分类号 |
C01B13/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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