发明名称 Agglomeration elimination for metal sputter deposition of chalcogenides
摘要 A method for fabricating chalcogenide materials on substrates, which reduces and/or eliminates agglomeration of materials on the chalcogenide materials; and system and devices for performing the method, semiconductor devices so produced, and machine readable media containing the method. One method disclosed includes forming a first layer, forming a second layer on the first layer, forming a third layer on the second layer, wherein the third layer is essentially transparent to irradiation, and irradiating the second layer through the third layer to cause the second layer to diffuse into the first layer thereby creating an integral layer of materials from the first and second layers.
申请公布号 US2004144973(A1) 申请公布日期 2004.07.29
申请号 US20040758008 申请日期 2004.01.16
申请人 LI JIUTAO 发明人 LI JIUTAO
分类号 H01L27/24;H01L45/00;(IPC1-7):H01L29/06 主分类号 H01L27/24
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