MICROSTRUCTURE COMPRISING AN ADHESIVE COATING AND METHOD FOR MAKING SAME

摘要

The invention concerns a microstructure comprising an adhesive coating (1) between a substrate (2) and a photostructurable coating (4), arranged on at least one surface of the substrate (2). The adhesive coating (1) is photosensitive and consists of a negative resin comprising at least one polymer of the family of elastomers and at least one photoinitiator, in solution in an aromatic solvent. The photostructurable coating (4) consists of at least one negative epoxy resin. The method for making such a microstructure comprises spreading and drying the adhesive coating (1) prior to depositing the photostructurable coating (4). The adhesive coating (1) can be exposed through a mask and developed, prior to the deposition of the photostructurable coating (4).