| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a (meth)acrylic polymer high in transparency to radiation, excellent in basic properties as a resist such as sensitivity, resolution, dry etching resistance, pattern form, etc. especially excellent in the solubility to a resist solvent, and suitable for a radiation-sensitive resin compound which reduces the roughness on a pattern side wall after developing. <P>SOLUTION: This (meth)acrylic polymer contains the repeating unit represented by formula (1) wherein R represents hydrogen or a methyl group, A is represented as -(-(1-12C alkylene group)-O-)<SB>m</SB>- , m represents an integer of 1-3, and an oxygen atom bonded to an alkylene group is bonded to a norbornane ring derivative. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
