发明名称 |
Lithographic apparatus |
摘要 |
A lithographic projection apparatus is provided with an optical system built into the wafer table for producing an image of a wafer mark that is provided on the back side of the wafer. The image is located at the plane of the front side of the wafer and can be viewed by an alignment system from the front side of the wafer. Simultaneous alignment between marks on the back and front of the wafer and a mask can be performed using a pre-existing alignment system
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申请公布号 |
US6768539(B2) |
申请公布日期 |
2004.07.27 |
申请号 |
US20020043271 |
申请日期 |
2002.01.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
GUI CHENG-QUN;VAN BUEL HENRICUS WILHEIMUS MARIA;VAN DER SCHAAR MAURITS;DEN BOEF ARIE JEFFREY |
分类号 |
G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/42;G03B27/32;G01B11/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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