发明名称 Protection of photographic material
摘要 A method of processing photosensitive materials in which one or more chemical compounds are at least partially retained after processing. The chemical compounds are unique to a particular process used by a copyright owner. The absence of the unique compounds in a processed material thus indicates that the processing has been without the authorization of the copyright owner.
申请公布号 US6767681(B2) 申请公布日期 2004.07.27
申请号 US20030437126 申请日期 2003.05.13
申请人 EASTMAN KODAK COMPANY 发明人 FYSON JOHN R.
分类号 G03C11/00;G03C5/26;G03C7/30;(IPC1-7):G03C5/26 主分类号 G03C11/00
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