发明名称 Asymmetric plating
摘要 A method and apparatus are disclosed for forming a tapered contact structure over a contact pad. The tapered contact structure may be used to securely anchor an overlying solder bump or solder ball. Additionally, the tapered contact structure allows the use of either larger contact pads or, alternately, allows a greater density of contact pads to be achieved on an integrated circuit substrate.
申请公布号 US6767817(B2) 申请公布日期 2004.07.27
申请号 US20020193001 申请日期 2002.07.11
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.;LINDGREN JOSEPH T.
分类号 C25D3/12;C25D5/02;C25D7/12;H01L21/288;H01L21/60;H01L23/485;H05K3/24;H05K3/40;(IPC1-7):C23C18/32 主分类号 C25D3/12
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