| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal etched component which has achieved a high etching factor, can reproduce a metallic pattern so as to acquire a designed precision, and an etched cross-section having a high aspect ratio and high definition, and to provide a manufacturing method therefor. SOLUTION: The metal etched product has a metallic pattern having a side wall made by a primary etching which makes an opening on the surface layer side of a metal layer, and a side wall made by a secondary etching in a deep layer side, which uses an electrodeposited photoresist; and having the etching factor of the opening in the metallic pattern controlled to 2.6 or higher. COPYRIGHT: (C)2004,JPO&NCIPI
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