| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a stencil mask wherein an opening is micromachined while keeping a constant strength, and also to provide its producing process. <P>SOLUTION: In the stencil mask 1, a silicon thin film 6 on which an opening pattern 7 is formed is supported by a supporting part 4 through a silicon oxide film 3. The silicon thin film 6 has a two layer structure of a first silicon thin film 2 and a second silicon thin film 5 laid in layers. Each of the first and second silicon thin films 2 and 5 can micromachine an opening 7, and the strength of the stencil mask is enhanced by laying them in layers thereby making thick the silicon thin film. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
