VAPOR DEPOSITION FILM STRONG IN ADHESION HAVING ANTISTATIC CAPACITY

摘要

PROBLEM TO BE SOLVED: To provide a vapor deposition film strong in adhesion having an antistatic capacity as a gas barrier film yielding no delamination by increasing the adhesion of an electrically chargeable plastic substrate and a vapor deposition film. SOLUTION: Pretreatment using plasma of a reactive ion etching (RIE) mode is applied to at least one surface of a substrate consisting of an antistatic plastic material, and a vapor deposition layer with a thickness of 5-100 nm comprising a metal or an inorganic compound is provided on the treated surface of the substrate to constitute the vapor deposition film strong in adhesion having the antistatic capacity. COPYRIGHT: (C)2004,JPO&NCIPI