| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a halftone phase shift mask blank in which the transmittance can be easily controlled without varying phase difference by controlling the refractive index of the transmittance controlling layer to a desired value in a shifter layer comprising a phase difference controlling layer and the transmittance controlling layer, and a halftone phase shift mask. <P>SOLUTION: The halftone phase shift mask blank 10 has the shifter layer 4 comprising the transmittance controlling layer having the refractive index n satisfying 0.9≤n≤1.1 and the extinction coefficient k satisfying 1.0<k and the phase difference controlling layer 3 having the phase difference controlled to 180, on a transparent substrate 1. A resist pattern 5 is formed on the halftone phase shift mask blank 10, the shifter layer 4 is patterned by dry etching or the like, and the resist pattern 5 is removed to obtain the halftone phase shift mask 100 having the shift pattern 4a comprising a transmittance controlling pattern 2a and a phase difference controlling pattern 3a. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p> |
