发明名称 MULTILAYER STRUCTURE, ITS MANUFACTURING METHOD, FUNCTIONAL STRUCTURE, ITS MANUFACTURING METHOD, ELECTRON-BEAM EXPOSURE MASK, AND ITS MANUFACTURING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To manufacture various types of functional structures including a micro-mirror inexpensively and accurately in a simple and convenient manner. <P>SOLUTION: A multi-layer structure is manufactured by cold bonding first and second layers 2 and 3, at least one of which is made of single crystalline material via a metallic film 1 such as an Al film containing one or more sorts of metals. The first and second layers both can be made of the single crystalline material or made of mutually different materials. The first and second layers are each, for example, a single crystalline Si layer or a single crystalline Si substrate. The multi-layer structure is used, e.g., to manufacture the micro-mirror. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004207625(A) 申请公布日期 2004.07.22
申请号 JP20020377413 申请日期 2002.12.26
申请人 SONY CORP 发明人 HARA MASATERU
分类号 B81B3/00;B81C1/00;G03F1/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 B81B3/00
代理机构 代理人
主权项
地址