发明名称 |
Grating test patterns and methods for overlay metrology |
摘要 |
Overlay measurements are obtained by forming a first grating test pattern using a first layer mask. A second grating test pattern is formed using a second layer mask. The first and second grating test patterns have the same periodicity. The first and second grating test patterns are measured using an optical metrology equipment. The alignment of the second layer mask to the first layer mask is measured based on the measurement of the first and second grating test patterns.
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申请公布号 |
US2004137341(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030739660 |
申请日期 |
2003.12.17 |
申请人 |
NIU XINHUI;JAKATDAR NICKHIL |
发明人 |
NIU XINHUI;JAKATDAR NICKHIL |
分类号 |
G03F1/08;G02B27/44;G03F7/20;H01L21/027;(IPC1-7):G03F9/00;G03C5/00;G03B27/52;G01B11/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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