| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a color filter black matrix resist composition with which a thin-film pattern with high light shielding property can easily be formed by a photolithographic method and superior storage stability, and sufficient sensitivity and resolution can be obtained. <P>SOLUTION: The color filter black matrix resist composition contains (A) carbon black with specific properties (mean primary particle size and density of a carboxyl group on a surface), (B) a copolymer having an amino group or its quaternary ammonium salt, (C) a carbon black dispersed liquid composition for color filter black matrix resist containing an organic solvent, (D) a binder resin with a carboxyl group, (E) an ethylene unsaturated monomer, (F) a photopolymerization initiator, and (G) a specified multifunctional thiol compound. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
