| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a two-wavelength reflection preventing film in which a sufficiently wide wavelength reflection preventing band centered around the designed wavelengths (532 nm and 1,064 nm) is given and to provide a forming method of the film. <P>SOLUTION: A multilayered film is made by laminating five layers of thin films on the surface of a substrate. The five layer thin films are formed in the following order that the farthest one from the substrate surface, i.e., a first layer thin film is made of low refractive index material, a second layer thin film made of high refractive index material, a third layer thin film made of low refractive index material or intermediate refractive index material, a fourth layer thin film made of high refractive index material and a fifth layer thin film made of low refractive index material or intermediate refractive index material. These layers are laminated in the following film thickness, the first layer is 0.12λ<SB>0</SB>to 0.2λ<SB>0</SB>, the second layer is 0.04λ<SB>0</SB>to 0.13λ<SB>0</SB>, the third layer is 0.03λ<SB>0</SB>to 0.11λ<SB>0</SB>, the fourth layer is 0.17λ<SB>0</SB>to 0.30λ<SB>0</SB>and the fifth layer is 0.41λ<SB>0</SB>to 0.84λ<SB>0</SB>where λ<SB>0</SB>is a design major wavelength. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
