| 摘要 |
PROBLEM TO BE SOLVED: To provide a reflection preventing film modification device and method capable of achieving effects equivalent to a selective removal of reflection preventing film without causing any particle by an inexpensive and short term processing. SOLUTION: This device is configured to change the optical characteristics of a reflection preventing film F for preventing the reflection of light in an exposure wavelength range by selectively modifying the reflection preventing film F on an alignment mark with respect to a substrate W on which the reflection preventing film F is formed. The substrate W held on a stage 1 is irradiated with modified light from a modified light optical source 4 through an aperture 5 and an imaging optics 3. When the emission of the modified light is carried out until the accumulated quantity of lights measured by an accumulated light quantity meter 6 reaches predetermined light quantity, the optical characteristics of the reflection preventing film F are changed, and the observation of an alignment mark with the exposure wavelength is made possible. COPYRIGHT: (C)2004,JPO&NCIPI |
