发明名称 FILM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of suppressing wobbling of a film deposition surface at low cost by the electric control without enhancing the machining accuracy and the fitting accuracy. SOLUTION: The film deposition apparatus comprises a rotary shaft supported by a bearing fixed to a device substrate, a rocking substrate holder supported by the rotary shaft and a rotational surface moving unit, a magnet disposed on a lower surface of the substrate holder, an electromagnet disposed on a device substrate surface facing the magnet, a sensor to detect the wobbling of the substrate holder or a film deposition substrate placed on the substrate holder, and a control circuit which feeds back the wobbling signal from the sensor to the electromagnet, and controls the magnetic force applied between the magnets to suppress the wobbling of the substrate holder. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004197137(A) 申请公布日期 2004.07.15
申请号 JP20020364793 申请日期 2002.12.17
申请人 JAPAN AVIATION ELECTRONICS INDUSTRY LTD 发明人 MACHIDA HARUMASA
分类号 G01B21/00;C23C14/50;(IPC1-7):C23C14/50 主分类号 G01B21/00
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