发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING TRANSPARENT CONDUCTIVE FILM SUBSTRATE, COLOR FILTER SUBSTRATE AND ITS MANUFACTURING METHOD, ELECTROOPTIC APPARATUS AND ELECTRONIC EQUIPMENT |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a transparent conductive film for forming a transparent conductive film with low specific resistance and high quality on a substrate having a material with low heat resistance such as a resin not under a high temperature condition, an apparatus for manufacturing the film for use in the method, a method for manufacturing a color filter substrate, a color filter substrate manufactured by that method, an electrooptic apparatus with the filter substrate mounted thereon and electronic equipment with the electrooptic apparatus mounted thereon. <P>SOLUTION: A desired transparent conductive film with low specific resistance can be formed not under the high temperature condition by applying a pulse voltage with a duty ratio between 0.01 and 0.25. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004199894(A) |
申请公布日期 |
2004.07.15 |
申请号 |
JP20020363863 |
申请日期 |
2002.12.16 |
申请人 |
SEIKO EPSON CORP |
发明人 |
FUJII EIJI;WANIKAWA KUNIO;NAKAMURA CHUYA |
分类号 |
G02F1/1335;C23C14/08;C23C14/40;G02F1/1343;H01B5/14;H01B13/00 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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