| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which suppresses the changes in sensitivity with time during storage and which can form a resist pattern having a preferable cross-sectional profile, excellent adhesion property with a substrate and being easily dissolved and stripped with a stripping liquid. <P>SOLUTION: The radiation-sensitive resin composition contains: (A) an alkali-soluble resin containing at least a resin obtained by polymerization of a carbonyl group-containing compound, amines, and if necessary, phenols; (B) a photosensitive agent; (C) an antioxidant; and (D) a solvent. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
