| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of easily and inexpensively forming an uneven shape on a resin surface simultaneously with formation of a substrate exposed surface, and to provide an optical film, a diffuse reflective plate, and a film having an uneven surface which are obtained by the method. <P>SOLUTION: The method of forming unevenness on a surface in accordance with a mask pattern comprises a surface unevenness forming step group (A) and a step group (B), and the step group (A) includes steps of; forming an energy-sensitive negative resin composition layer containing one or more kinds of polymerizable monomers or oligomers; irradiating the energy-sensitive negative resin composition layer with active energy rays except parts which should be removed; and etching (developing) and preheating the non-irradiated parts of the energy-sensitive resin composition layer, and the step group (B) includes a step of radiating active energy rays at least once through a mask having a pattern formed and a step of postheating, and step groups (A) and (B) are performed in order. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
