| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which is improved in the uniformity of plasma treatment. SOLUTION: The plasma treatment apparatus uses a method wherein electromagnetic waves are radiated and discharged in magnetic fields, and it comprises a plasma treatment chamber 1, means for supplying treatment gas to the plasma treatment chamber, evacuation means for decompressing the plasma treatment chamber, electrode 3 to place a workpiece 6 such as a wafer, electromagnetic wave radiation power supplies 4A and 4B, electromagnetic radiation antenna 2, a plurality of magnetic coils 9A and 9B which form nearly vertical magnetic fields in the treatment chamber, and yokes 10A and 10B. The yokes 10A and 10B are installed separately in the respective magnetic coils 9A and 9B. Furthermore, a non-magnetic material 11 is placed between the yokes to independently control a local distribution of magnetic fields. COPYRIGHT: (C)2004,JPO&NCIPI
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