发明名称 |
Glass substrate for a mask blank, method of producing a glass substrate for a mask blank, mask blank, method of producing the mask blank, transfer mask, and method of producing a transfer mask |
摘要 |
In a method of producing a glass substrate for an electronic device whereby to fabricate a glass substrate by carrying out a rough polishing step for polishing a surface of the glass substrate by using relatively large abrasive particles, then a precision polishing step for polishing it by using relatively small abrasive particles, a method of producing a glass substrate for an electronic device, and a photo mask blank and a method of producing a photo mask, wherein, before carrying out the precision polishing step, the surface of the glass substrate is etched (preferably etched with an alkaline aqueous solution) so as to elicit a crack extending in the depth direction from the surface of the glass substrate, the crack remaining after the precision polishing step, in a defect inspection step carried out after the precision polishing step.
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申请公布号 |
US2004137828(A1) |
申请公布日期 |
2004.07.15 |
申请号 |
US20030619181 |
申请日期 |
2003.07.15 |
申请人 |
HOYA CORPORATION |
发明人 |
TAKAHASHI KOUJI;ITOH HIROO |
分类号 |
C03C15/02;C03C19/00;G03F1/00;(IPC1-7):B24B1/00 |
主分类号 |
C03C15/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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