METHOD FOR IRRADIATING A RESIST

摘要

The invention relates to a method according to which a photosensitive resist layer arrangement (10) is produced after the production of a layer (12) to be structured, and is vertically selectively structured. Said resist layer arrangement contains, for example, a lower layer of lacquer (14) and an upper layer of lacquer (18). The inventive method enables less steps to be carried out during the production of an integrated circuit arrangement.