METHOD FOR SELECTIVELY DEPOSITING ORGANIC SEMICONDUCTOR

摘要

PURPOSE: A method for selectively depositing an organic semiconductor is provided to decrease the number or processes and have no limit to a minimum pattern size caused by the thickness of a shadow mask by forming a pattern during a deposition process while using the shadow mask. CONSTITUTION: At least two different materials(2,3) are disposed on the surface of a substrate(1). The deposition rate of an organic semiconductor(4) deposited on the different materials is controlled to deposit the organic semiconductor only on a specific material. The different materials are patterned by a deposition process of a thin film and a photolithography process so as to dispose the different materials on the surface of the substrate.