| 摘要 |
The invention relates to an intervertebral implant comprising a spacer (2) in which two opposite notches (6a, 6b) are formed suitable for receiving two respective spinus processes (26a, 26b) of two vertebrae, each notch defining two flanges (8a, 10a, 8b, 10b) each having an inside wall, and the implant also having a tie (4a, 4b) for holding said spacer on said spinus processes. Said tie is constituted by at least one strap having a portion surrounding a portion of the surface of a spinus process that is opposite from the bottom of the notch. Said implant has first fixing means (12a, 12b) formed in at least one flange (8a, 8b) for fixing a first end (18a, 18b) of said strap, and self-locking second fixing means (14a, 16a, 14b, 16b) formed in at least one other flange (10a, 10b) and through which the second end (20a, 20b) of said strap is inserted and then pulled to hold said strap (4a, 4b) in position, thereby securing said spacer (2) to said spinus processes (26a, 26b).
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