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发明名称
CHEMICAL AMPLIFICATION TYPE SILICONE BASE POSITIVE PHOTORESIST COMPOSITION
摘要
申请公布号
AU2003302990(A1)
申请公布日期
2004.07.09
申请号
AU20030302990
申请日期
2003.12.01
申请人
TOKYO OHKA KOGYO CO., LTD.
发明人
KOUKI TAMURA;KAZUFUMI SATO;TAKU HIRAYAMA;TOMOTAKA YAMADA;DAISUKE KAWANA
分类号
C08G77/04;C08L83/06;G03F7/004;G03F7/075;(IPC1-7):G03F7/11;C08G77/14;H01L21/027
主分类号
C08G77/04
代理机构
代理人
主权项
地址
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