| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a polymer silicone compound suitable for a base resin of a resist material used for microfabrication in a production process of a semiconductor element, to provide the resist material suitable for exposure with a light source of high energy rays such as far ultraviolet rays, electron beams and X-rays, and a process for pattern formation. <P>SOLUTION: The polymer silicone compound comprises a repeating unit shown by formula (1) or a repeating unit in which a part or whole H atom(s) of carboxyl groups is replaced with acid labile group(s), wherein Z is a non-aromatic mono- or poly-cyclic hydrocarbon group or a bridged cyclic hydrocarbon group; Z' is a hydrocarbon group, or a non-aromatic mono- or poly-cyclic hydrocarbon group or a bridged cyclic hydrocarbon group; (x), (y) and (z) are each an integer of 1-5 corresponding to valencies of above Z and Z'; R<SP>1</SP>is OCHR-R'-OH or NHCHR-R'-OH; R<SP>2</SP>is an alkyl or an alkenyl group or a non-aromatic univalent polycyclic hydrocarbon group or a bridged cyclic hydrocarbon group; p1 and p2 are each a positive number; p3 is 0 or a positive number and p4 is 0, or p1 and p4 are each a positive number; p3 is 0 or a positive number and p2 is 0. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
