发明名称 METHOD FOR FORMING CONDUCTIVE ELEMENT AND METHOD FOR FORMING REFLECTIVE ELECTRODE OF LIQUID CRYSTAL DISPLAY
摘要 <P>PROBLEM TO BE SOLVED: To form a conductive element such as a reflective electrode 16 in a liquid crystal display by subjecting a layered film comprising a metal conductive film such as an Al film 28 and an amorphous conductive film such as an IZO (indium zinc oxide) film 29 which is more difficult to etch than the metal conductive film to etching by an etching liquid for the metal conductive film, and to pattern the layered film while preventing the end part of the amorphous conductive film from protruding from the end part of the metal conductive film. <P>SOLUTION: The amorphous conductive film on the metal conductive film is subjected to plasma treatment in a CF<SB>4</SB>/O<SB>2</SB>gas atmosphere so as to make the amorphous conductive film easily etched, and then the layered film is patterned by using the etching liquid. <P>COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004191958(A) 申请公布日期 2004.07.08
申请号 JP20030394426 申请日期 2003.11.25
申请人 SHARP CORP 发明人 ISHIZUKA KAZUHIRO;OGURA MASAFUMI;KATAOKA YOSHIHARU;MIZUNO SHUHEI;YOSHIDA ATSUSHI
分类号 G02F1/1343;G02F1/1368;H01L21/306;H01L21/3213 主分类号 G02F1/1343
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